The CS-1000 is HORIBA's chemical solution monitoring system for simultaneous concentration management of multi-component chemical solutions used in semiconductor BEOL (back end of line) wiring formation processes. Combining an enhanced absorption spectrometer (expanded wavelength range, improved resolution) with a 2-electrode conductivity meter and a glass electrode pH meter, it detects trace chemical components at ppm level without sample pretreatment. Two completely isolated sample flow lines enable simultaneous monitoring of two different chemical solutions from a single all-in-one cabinet. SEMI S2 certified; maintenance requires only 4 hours every six months.
The CS-1000 is HORIBA's chemical solution monitoring system for real-time concentration management of multi-component chemical solutions in semiconductor BEOL (back end of line) wiring formation processes. By combining an enhanced spectrometer — with expanded wavelength range and improved resolution — with a 2-electrode conductivity meter (carbon sensor) and a glass electrode pH meter, the CS-1000 detects low-concentration trace components at the ppm level in complex chemical matrices without requiring any sample pretreatment. The instrument is equipped with two completely isolated sample flow lines, enabling simultaneous monitoring of two different chemical solutions from a single all-in-one cabinet installed directly at the manufacturing site. Automatic cleaning and automatic pH calibration functions minimise operator intervention, reducing total maintenance to approximately 4 hours every six months — with consumables limited to lamp replacement and pH reagent replenishment on a 6-month cycle. The CS-1000 is supplied as a complete, self-contained cabinet system, certified to SEMI S2 for safe use in semiconductor fabrication environments.
Key Features CS-1000
- ppm-level trace chemical component detection via enhanced absorption spectrometer — no sample pretreatment required.
- Simultaneous measurement of chemical concentration, conductivity, and pH from two independent isolated sample flow lines — monitors two different chemical solutions concurrently.
- All-in-one cabinet system — ready for installation at the semiconductor manufacturing site without additional integration work.
- Automatic cleaning and automatic pH calibration — minimise operator intervention and ensure measurement stability.
- Low maintenance: approx. 4 hours every 6 months — consumables limited to halogen lamp (~1 year life), deuterium lamp (~6 months), and pH reagents (~6 months).
- Comprehensive outputs: 4–20 mA hardwired analogue; RS-485 Modbus RTU serial; parallel I/O.
- Wetted materials: PFA, PTFE, Quartz, Kalrez™, carbon, glass, PEEK, ETFE, PVC, THV, PharMed BPT — chemically resistant to aggressive semiconductor process chemicals.
- SEMI S2 certified; CE; KC; FCC Part 15; UKCA.
Applications
The CS-1000 is suited to real-time concentration management of multi-component chemical solutions in semiconductor BEOL (back end of line) processes — including chemical bath monitoring for Cu plating, CMP slurry management, and other wiring formation steps where ppm-level trace component detection and simultaneous dual-solution monitoring are required for process quality control.
Installation and Safety Notes
Install in a controlled indoor environment at 20–30 °C (temperature change within ±0.5 °C/h; avoid sudden temperature changes); humidity 40–70% RH (no condensation). Power: 190–240 V AC single-phase, 50/60 Hz, approx. 355 VA (excluding start-up transient current). Sudden temperature changes should be avoided to ensure spectrometer measurement stability. The system is SEMI S2 certified for semiconductor fab environments. Consult HORIBA for target chemical solution compatibility and application-specific configuration.
Technical Specifications
| Measurement parameters | Chemical concentration; Conductivity; pH |
| Measurement principles | Absorption spectroscopy (concentration); 2-electrode method — carbon sensor (conductivity); Glass electrode (pH) |
| Detection level | ppm level (trace component detection without pretreatment) |
| Sample flow lines | 2 independent isolated flow lines — simultaneous monitoring of two different chemical solutions |
| Target chemicals | Multi-component chemical solutions in semiconductor BEOL processes (contact HORIBA for details) |
| Automatic functions | Automatic cleaning; automatic pH calibration |
| Outputs | 4–20 mA hardwired analogue; RS-485 Modbus RTU; parallel I/O |
| Signal output (error) | Fixed at 1.5 mA when measured values are not updated (e.g. monitor error) |
| Wetted materials | Cabinet: PFA, PTFE; Absorbance monitor: PFA, PTFE, Quartz, Kalrez™; Conductivity meter: PFA, carbon, Kalrez™; pH meter: PVC, PTFE, glass, ETFE, PEEK, olefinic resin, THV, PFA, Kalrez™, PharMed BPT |
| Power supply | 190–240 V AC, single-phase, 50/60 Hz; approx. 355 VA |
| Ambient temperature | 20–30 °C (±0.5 °C/h; avoid sudden changes) |
| Ambient humidity | 40–70% RH (no condensation) |
| Maintenance interval | Approx. 4 hours every 6 months |
| Consumables | Halogen lamp (~1 year); Deuterium lamp (~6 months); pH reagents: pH4, pH7, KCl 3.33 mol/L AgCl saturated (~6 months) |
| Dimensions (W × D × H) | 700 × 610 × 1640 mm (excl. protrusions) |
| Weight | Approx. 200 kg |
| Compliance | CE; KC; FCC Part 15; UKCA; SEMI S2 |
| Manufacturer | HORIBA Advanced Techno Co., Ltd. |
| Brand | Horiba |
